Publications

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AlGaN-channel high electron mobility transistors (HEMTs) are among a class of ultra wide-bandgap transistors that are promising candidates for RF and power applications. Long-channel Al_xGa_1-xN HEMTs with x = 0.7 in the channel have been built and evaluated across the -50°C to +200°C temperature range. These devices achieved room temperature drain current as high as 46 mA/mm and were absent of gate leakage until the gate diode forward bias turn-on at ~2.8 V, with a modest -2.2 V threshold voltage. A very large I_on/I_off current ratio, of 8 × 10⁹ was demonstrated. A near ideal subthreshold slope that is just 35% higher than the theoretical limit across the temperature range was characterized. The ohmic contact characteristics were rectifying from -50°C to +50°C and became nearly linear at temperatures above 100°C. An activation energy of 0.55 eV dictates the temperature dependence of off-state leakage.

Gallium Nitride (GaN) semiconductors have extremely low switching loss, high breakdown voltage, and high junction temperature rating. These characteristics enable improved device performance and thus improved switch mode power converter designs. This paper evaluates the Pareto-optimal performance improvements for a DC generation system with predicted GaN loss characteristics and a rigorous multi-objective optimization based design paradigm. The optimization results show that the application of GaN can achieve a 6.4% mass savings relative to Silicon Carbide (SiC) and 40% mass savings relative to Silicon (Si) at the same loss level for a 10 kW application.

In order to determine how material characteristics percolate up to system-level improvements in power dissipation for different material systems and device types, we have developed an optimization tool for power diodes. This tool minimizes power dissipation in a diode for a given system operational regime (reverse voltage, forward current density, frequency, duty cycle, and temperature) for a variety of device types and materials. We have carried out diode optimizations for a wide range of system operating points to determine the regimes for which certain power diode materials/devices are favored. In this work, we present results comparing state-of-the-art Si and SiC merged PiN Schottky (MPS) diodes to vertical GaN (v-GaN) PiN diodes and as-yet undeveloped v-GaN Schottky barrier diodes (SBDs). The results of this work show that for all conditions tested, SiC MPS and v-GaN PiN diodes are preferred over Si MPS diodes. v-GaN PiN diodes are preferred over SiC MPS diodes for high-voltage / moderate-frequency operation with the limits of the v-GaN PiN preferred regime, increasing with increasing forward current density. If a v-GaN SBD diode were available, it would be preferred over all other devices at low to moderate voltages, for all frequencies from 100 Hz to 1 MHz.

A system is presented that is capable of measuring subnanosecond reverse recovery times of diodes in wide-bandgap materials over a wide range of forward biases (0 - 1 A) and reverse voltages (0 - 10 kV). The system utilizes the step recovery technique and comprises a cable pulser based on a silicon (Si) Photoconductive Semiconductor Switch (PCSS) triggered with an Ultrashort Pulse Laser, a pulse charging circuit, a diode biasing circuit, and resistive and capacitive voltage monitors. The PCSS-based cable pulser transmits a 130 ps rise time pulse down a transmission line to a capacitively coupled diode, which acts as the terminating element of the transmission line. The temporal nature of the pulse reflected by the diode provides the reverse recovery characteristics of the diode, measured with a high bandwidth capacitive probe integrated into the cable pulser. This system was used to measure the reverse recovery times (including the creation and charging of the depletion region) for two Avogy gallium nitride diodes; the initial reverse recovery time was found to be 4 ns and varied minimally over reverse biases of 50-100 V and forward current of 1-100 mA.

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With the next generation of semiconductor materials in development, significant strides in the Size, Weight, and Power (SWaP) characteristics of power conversion systems are presently underway. In particular, much of the improvements in system-level efficiencies and power densities due to wide-bandgap (WBG) and ultra-wide-bandgap (UWBG) device incorporation are realized through higher voltage, higher frequency, and higher temperature operation. Concomitantly, there is a demand for ever smaller device footprints with high voltage, high power handling ability while maintaining ultra-low inductive/capacitive parasitics for high frequency operation. For our work, we are developing small size vertical gallium nitride (GaN) and aluminum gallium nitride (AlGaN) power diodes and transistors with breakdown and hold-off voltages as high as 15kV. The small size and high power densities of these devices create stringent requirements on both the size (balanced between larger sizing for increased voltage hold-off with smaller sizing for reduced parasitics) and heat dissipation capabilities of the associated packaging. To accommodate these requirements and to be able to characterize these novel device designs, we have developed specialized packages as well as test hardware and capabilities. This work describes the requirements of these new devices, the development of the high voltage, high power packages, and the high-voltage, high-Temperature test capabilities needed to characterize and use the completed components. In the course of this work, we have settled on a multi-step methodology for assessing the performance of these new power devices, which we also present.

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Radiation responses of high-voltage, vertical gallium-nitride (GaN) diodes were investigated using Sandia National Laboratories’ nuclear microprobe. Effects of the ionization and the displacement damage were studied using various ion beams. We found that the devices show avalanche effect for heavy ions operated under bias well below the breakdown voltage. The displacement damage experiments showed a surprising effect for moderate damage: the charge collection efficiency demonstrated an increase instead of a decrease for higher bias voltages.

Due to the ultra-wide bandgap of Al-rich AlGaN, up to 5.8 eV for the structures in this study, obtaining low resistance ohmic contacts is inherently difficult to achieve. A comparative study of three different fabrication schemes is presented for obtaining ohmic contacts to an Al-rich AlGaN channel. Schottky-like behavior was observed for several different planar metallization stacks (and anneal temperatures), in addition to a dry-etch recess metallization contact scheme on Al0.85Ga0.15N/Al0.66Ga0.34N. However, a dry etch recess followed by n+-GaN regrowth fabrication process is reported as a means to obtain lower contact resistivity ohmic contacts on a Al0.85Ga0.15N/Al0.66Ga0.34N heterostructure. Specific contact resistivity of 5 × 10−3 Ω cm2 was achieved after annealing Ti/Al/Ni/Au metallization.

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Devices based on GaN have shown great promise for high power electronics, including their potential use as radiation tolerant components. An important step to realizing high power diodes is the design and implementation of an edge termination tomitigate field crowding, which can lead to premature breakdown. However, little is known about the effects of radiation on edge termination functionality. We experimentally examine the effects of proton irradiation on multiple field ring edge terminations in high power vertical GaN PIN diodes using in operando imaging with electron beam induced current (EBIC). We find that exposure to proton irradiation influences field spreading in the edge termination as well as carrier transport near the anode. By using depth-dependent EBIC measurements of hole diffusion length in homoepitaxial n-GaN we demonstrate that the carrier transport effect is due to a reduction in hole diffusion length following proton irradiation.

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Predicted lateral power device performance as a function of alloy composition is characterized by a standard lateral device figure-of-merit (LFOM) that depends on mobility, critical electric field, and sheet carrier density. The paper presents calculations of AlGaN electron mobility in lateral devices such as HEMTs across the entire alloy composition range. Alloy scattering and optical polar phonon scattering are the dominant mechanisms limiting carrier mobility. Due to the significant degradation of mobility from alloy scattering, at room temperature Al fractions greater than about 85% are required for improved LFOM relative to GaN using a conservative sheet charge density of 1 × 1013 cm−2. However, at higher temperatures at which AlGaN power devices are anticipated to operate, this “breakeven” composition decreases to about 65% at 500 K, for example. For high-frequency applications, the Johnson figure-of-merit (JFOM) is the relevant metric to compare potential device performance across materials platforms. At room temperature, the JFOM for AlGaN alloys is predicted to surpass that of GaN for Al fractions greater than about 40%.

"Ultra" wide-bandgap semiconductors are an emerging class of materials with bandgaps greater than that of gallium nitride (EG >3.4 eV) that may ultimately benefit a wide range of applications, including switching power conversion, pulsed power, RF electronics, UV optoelectronics, and quantum information. This paper describes the progress made to date at Sandia National Laboratories to develop one of these materials, aluminum gallium nitride, targeted toward high-power devices. The advantageous material properties of AlGaN are reviewed, questions concerning epitaxial growth and defect physics are covered, and the processing and performance of vertical- and lateral-geometry devices are described. The paper concludes with an assessment of the outlook for AlGaN, including outstanding research opportunities and a brief discussion of other potential applications.

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The effects of paralleling low-current vertical Gallium Nitride (v-GaN) diodes in a custom power module are reported. Four paralleled v-GaN diodes were demonstrated to operate in a buck converter at 1.3 Apeak (792 mArms) at 240 V and 15 kHz switching frequency. Additionally, high-fidelity SPICE simulations demonstrate the effects of device parameter variation on power sharing in a power module. The device parameters studied were found to have a sub-linear relationship with power sharing, indicating a relaxed need to bin parts for paralleling. This result is very encouraging for power electronics based on low-current v-GaN and demonstrates its potential for use in high-power systems.

The switching characteristics of vertical Gallium Nitride (v-GaN) diodes grown on GaN substrates are reported. v-GaN diodes were tested in a Double-Pulse Test Circuit (DPTC) and compared to test results for SiC Schottky Barrier Diodes (SBDs) and Si PiN diodes. The reported switching characteristics show that GaN diodes, like SiC SBDs, exhibit nearly negligible reverse recovery current compared to traditional Si PiN diodes. The reverse recovery for the v-GaN PiN diodes is limited by parasitics in the DPTC, precluding extraction of a meaningful recovery time. These results are very encouraging for power electronics based on v-GaN and demonstrate the potential for very fast, low-loss switching for these devices.

Varying atomic ratios in compound semiconductors is well known to have large effects on the etching properties of the material. The use of thin device barrier layers, down to 25 nm, adds to the fabrication complexity by requiring precise control over etch rates and surface morphology. The effects of bias power and gas ratio of BCl₃ to Cl₂ for inductively coupled plasma etching of high Al content AlGaN were contrasted with AlN in this study for etch rate, selectivity, and surface morphology. Etch rates were greatly affected by both bias power and gas chemistry. Here we detail the effects of small variations in Al composition for AlGaN and show substantial changes in etch rate with regards to bias power as compared to AlN.

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Electrical performance and characterization of deep levels in vertical GaN P-i-N diodes grown on low threading dislocation density (∼104 - 106cm-2) bulk GaN substrates are investigated. The lightly doped n drift region of these devices is observed to be highly compensated by several prominent deep levels detected using deep level optical spectroscopy at Ec-2.13, 2.92, and 3.2 eV. A combination of steady-state photocapacitance and lighted capacitance-voltage profiling indicates the concentrations of these deep levels to be Nt = 3 × 1012, 2 × 1015, and 5 × 1014cm-3, respectively. The Ec-2.92 eV level is observed to be the primary compensating defect in as-grown n-type metal-organic chemical vapor deposition GaN, indicating this level acts as a limiting factor for achieving controllably low doping. The device blocking voltage should increase if compensating defects reduce the free carrier concentration of the n drift region. Understanding the incorporation of as-grown and native defects in thick n-GaN is essential for enabling large VBD in the next-generation wide-bandgap power semiconductor devices. Thus, controlling the as-grown defects induced by epitaxial growth conditions is critical to achieve blocking voltage capability above 5 kV.

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