Finite element analysis of multilayer coextrusion
Abstract not provided.
Publications
Radiation tolerance in polymeric dielectrics by small-molecule doping I: Dopant uptake as a function of temperature time and chemistry
Polymer
Abstract not provided.
Radiation tolerance in polymeric dielectrics by small-molecule doping II: Thermodynamic and kinetic parameters
Polymer
Abstract not provided.
Polymer Science at Sandia National Laboratories: Fundamental Understanding to Practical Application
Abstract not provided.
Finite element analysis of multilayer coextrusion
Abstract not provided.
Linear accelerator electron testing of composite materials for space applications
Abstract not provided.
Linear accelerator electron testing of composite materials for space applications
Abstract not provided.
Effect of dopant structure on reduction of radiation-induced conductivity in poly(ethylene terephthalate)
Abstract not provided.
Polymer Science at Sandia National Laboratories: Fundamental Understanding to Practical Application
Abstract not provided.
Probing Polymeric Interfaces with Synchrotron Techniques
Abstract not provided.
An Overview of Foam Development at SNL-NM
Abstract not provided.
Effect of dopant structure on reduction of radiation-induced conductivity in poly(ethylene terephthalate)
Applied Physics Letters
Abstract not provided.
Near edge x-ray fine structure and dynamic contact angle measurements of polystyrene oxidized by ultraviolet-ozone
Langmuir
Abstract not provided.
Gel Fracture at High Stresses: The Effects of Sol Fraction
Abstract not provided.
Materials Research at Sandia: Fundamental Understanding to Practical Application
Abstract not provided.
The Role of Sol Molecular Weight and Mobility on the Short and Long Term Performance of Polymer Gels
Abstract not provided.
Multilayer Coextrusion of Polymer Nanocomposites
Abstract not provided.
Aging of self-assembled monolayers for anti-stiction coatings studied by near edge x-ray absorption fine structure
Abstract not provided.
Materials for Enabling Device Performance in Radiation Environments
Abstract not provided.
Materials Science at Sandia National Laboratories: Fundamental Understanding to Application
Abstract not provided.
Multilayer Coextrusion Processing for Micro/Nano-Layered Devices
Abstract not provided.
Soft polymeric gels for Sandia applications : fundamental materials development to practical implementation
Abstract not provided.
Copy of Radiation Tolerant Polymeric Materials through the Incorporation of Small Molecule Dopants
Abstract not provided.
Silanated Alumina for Novel Epoxy Composites
Abstract not provided.
Effect of Sol Molecular Weight on the Mechanical Properties and Sol Migration in Polymer Gels
Abstract not provided.
Silanated alumina for novel epoxy composites
Abstract not provided.
Fracture Toughness of Alumina Reinforced Epoxy Composites
Abstract not provided.
Understanding deviations in lithographic patterns near interfaces : characterization of Antireflective Coatings (ARC) and the ARC / resist interface
Proposed for publication in Applied Surface Science.
Abstract not provided.
Non-aqueous polymer gels
Abstract not provided.
Development of non-aqueous polymer gels that exhibit broad temperature performance
Proposed for publication in Advanced Materials.
Abstract not provided.
High performance alumina-epoxy composites with enhanced fracture toughness
Abstract not provided.
Influence of cross-link density on the thermal properties of thin polymer network films
Langmuir
X-ray reflectivity was used to characterize the thermal expansion of thin cross-linked polymer films. Changing the molecular mass of the hardener varied the cross-link density of the network. When the smaller-molecular-mass hardener was used, no changes in the apparent glass transition temperature (CTE) were observed in the thin films. When the larger-molecular-mass hardener was used, a transition from bulk to confined expansion occurred near 200 Å, where thinner films exhibit smaller rubbery expansion coefficients. For the lower cross-link density network, the thermal expansion behavior of the films was independent of the substrate surface treatment.
X-ray absorption spectroscopy to probe interfacial issues in photolithography
Proposed for publication in Langmuir.
We utilize near edge X-ray absorption fine structure spectroscopy (NEXASFS) to provide detailed chemical insight into two interfacial problems facing sub-100 nm patterning. First, chemically amplified photo-resists are sensitive to surface phenomenon, which causes deviations in the pattern profile near the interface. Striking examples include T-topping, closure, footing, and undercutting. NEXAFS was used to examine surface segregation of a photo-acid generator at the resist/air interface and to illustrate that the surface extent of deprotection in a model resist film can be different than the bulk extent of deprotection. Second, line edge roughness becomes increasingly critical with shrinking patterns, and may be intimately related to the line edge deprotection profile. A NEXAFS technique to surface depth profile for compositional gradients is described with the potential to provide chemical information about the resist line edge.
33 Results