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Sub-Micron Resolution of Localized Ion Beam Induced Charge Reduction in Silicon Detectors Damaged by Heavy Ions

IEEE Transactions on Nuclear Science

Auden, Elizabeth C.; Pacheco, Jose L.; Bielejec, Edward S.; Vizkelethy, Gyorgy V.; Abraham, John B.; Doyle, Barney L.

Displacement damage reduces ion beam induced charge (IBIC) through Shockley-Read-Hall recombination. Closely spaced pulses of 200 keVions focused in a 40 nm beam spot are used to create damage cascades within areas. Damaged areas are detected through contrast in IBIC signals generated with focused ion beams of {200 ions and 60 keV ions. IBIC signal reduction can be resolved over sub-micron regions of a silicon detector damaged by as few as 1000 heavy ions.

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TYPE Journal Article YEAR 2015
ScopusOSTIDOI

Silicon Quantum Dots with Counted Antimony Donor Implants

Sandia journal manuscript; Not yet accepted for publication

Singh, Meenakshi S.; Pacheco, Jose L.; Perry, Daniel L.; Ten Eyck, Gregory A.; Wendt, J.R.; Pluym, Tammy P.; Dominguez, Jason J.; Manginell, Ronald P.; Luhman, Dwight R.; Bielejec, Edward S.; Lilly, Michael L.; Carroll, Malcolm

Deterministic control over the location and number of donors is crucial to donor spin quantum bits (qubits) in semiconductor based quantum computing. A focused ion beam is used to implant close to quantum dots. Ion detectors are integrated next to the quantum dots to sense the implants. The numbers of ions implanted can be counted to a precision of a single ion. Regular coulomb blockade is observed from the quantum dots. Charge offsets indicative of donor ionization, are observed in devices with counted implants.

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TYPE Journal Article YEAR 2015
OSTI
Results 26–50 of 61
Results 26–50 of 61