Publications

Dentinger, Paul M.; Wu, Janson W.; Lee, Eunice S.; Lindblom, Scott C.; Skinner, J.L.; Gianoulakis, Steven E.; Strong, Fabian W.; Bochenski, Edwin B.

Abstract not provided.

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Cardinale, G.F.; Skinner, J.L.; Talin, A.A.; Brocato, Robert W.; Palmer, D.W.; Mancini, D.P.; Dauksher, W.J.; Gehoski, K.; Le, N.; Nordquist, K.J.; Resnick, D.J.

We report the surface acoustic wave (SAW) correlator devices fabricated using nanoimprint lithography. Using step-and-flash imprint lithography (S-FIL), we produced SAW correlator devices on 100 mm diameter z-cut LiNbO 3 devices and an aluminum metal etch process. On the same chip layout, we fabricated SAW filters and compared both the filters and correlators to similar devices fabricated using electron-beam lithography (EBL). Both S-FIL- and EBL-patterned correlators and SAW filters were analyzed using a bit-error rate tester to generate the signal and a parametric signal analyzer to evaluate the output. The NIL niters had an average center frequency of 2.38 GHz with a standard deviation of 10 MHz. The measured insertion loss averaged -31 dB. In comparison, SAW filters fabricated using EBL exhibited a center frequency of 2.39 GHz and a standard deviation of 100 kHz. Based on our preliminary results, we believe that S-FIL is an efficient and entirely viable fabrication method to produce quality SAW filters and correlators. © 2004 American Vacuum Society.