Microphotonic Thermal Detectors and Imagers
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Proceedings of SPIE - The International Society for Optical Engineering
A novel fabrication strategy has produced optical microring-resonator-based thermal detectors. The detectors are based on the thermo-optic effect and are thermally isolated from a silicon wafer substrate so as to maximize the temperature excursion for a given amount of incident radiation and minimize the impact of thermal phonon noise. The combination of high-Q, thermal isolation, and lack of Johnson noise offers thermal microphotonic detectors the potential to achieve significantly greater room temperature sensitivity than standard bolometric techniques. Several batch fabrication strategies were investigated for producing thermal microphotonic detectors using waveguide materials such as LPCVD Silicon Nitride (Si3N4) on Oxide and Silicon on Insulator (SOI). Fabrication challenges and loss reduction strategies will be presented along with some initial infrared detection results.
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IEEE/LEOS Optical MEMS 2005: International Conference on Optical MEMS and Their Applications
A physical parameter based model for dielectric charge accumulation is proposed and used to predict the displacement versus applied voltage and pull-in response of an electrostatic MEMS wavelength selective integrated optical switch. ©2005 IEEE.
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The introduction of new multifunctional materials provides the potential for expanding the realm of microsystems device design and applications. Titanium nitride is identified as an attractive candidate material for use in NEMS applications given its favorable electrical, mechanical and chemical properties thereby enabling its use in high frequency applications and in harsh environments. We demonstrate TiN NEMS structures and low temperature residual stress control of the TiN comprising those structures. Potential applications of TiN as a NEMS structural material are discussed, with particular emphasis on active nanophotonic devices.