Publications

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Images of the spatial structure of a capacitively coupled hydrogen discharge are presented for various strengths of applied magnetic field. With increasing magnetic field, we find that not only does the distribution of emission change because of the confinement of the electrons by the magnetic field, but we also find "dark-bands"regions that form in the discharge. By using narrowband interference filters (∼10 nm bandwidth), we examine how the relative optical emission centered on Hα and Hβ (with respect to the total optical emission) change with the applied magnetic field. © 2008 IEEE.

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Argon plasma characteristics in a dual-frequency, capacitively coupled, 300 mm-wafer plasma processing system were investigated for rf drive frequencies between 10 and 190 MHz. We report spatial and frequency dependent changes in plasma parameters such as line-integrated electron density, ion saturation current, optical emission and argon metastable density. For the conditions investigated, the line-integrated electron density was a nonlinear function of drive frequency at constant rf power. In addition, the spatial distribution of the positive ions changed from uniform to peaked in the centre as the frequency was increased. Spatially resolved optical emission increased with frequency and the relative optical emission at several spectral lines depended on frequency. Argon metastable density and spatial distribution were not a strong function of drive frequency. Metastable temperature was approximately 400 K. © 2006 IOP Publishing Ltd.

There is much interest in scaling rf-excited capacitively coupled plasma reactors to larger sizes and to higher frequencies. As the size approaches operating wavelength, concerns arise about non-uniformity across the work piece, particularly in light of the well-documented slow-surface-wave phenomenon. We present measurements and calculations of spatial and frequency dependence of rf magnetic fields inside argon plasma in an industrially relevant, 300 mm plasma-processing chamber. The results show distinct differences in the spatial distributions and harmonic content of rf fields in the plasma at the three frequencies studied (13.56, 60 and 176 MHz). Evidence of a slow-wave structure was not apparent. The results suggest that interaction between the plasma and the rf excitation circuit may strongly influence the structures of these magnetic fields and that this interaction is frequency dependent. At the higher frequencies, wave propagation becomes extremely complex; it is controlled by the strong electrical nonlinearity of the sheath and is not explained simply by previous models. © 2006 IOP Publishing Ltd.

Nonuniformities in both sheath electric field and plasma excitation were observed around dissimilar metals placed on a rf electrode. Spatial maps of the rf sheath electric field obtained by laser-induced fluorescence-dip (LIF-dip) spectroscopy show that the sheath structure was a function of the electrode metal. In addition to the electric-field measurements, LIF, optical emission, and Langmuir probe measurements show nonuniform excitation around the dissimilar metals. The degree and spatial extent of the discharge nonuniformities were dependent on discharge conditions and the history of the metal surfaces.

Dual-frequency reactors employ source rf power supplies to generate plasma and bias supplies to extract ions. There is debate over choices for the source and bias frequencies. Higher frequencies facilitate plasma generation but their shorter wavelengths may cause spatial variations in plasma properties. Electrical nonlinearity of plasma sheaths causes harmonic generation and mixing of source and bias frequencies. These processes, and the resulting spectrum of frequencies, are as much dependent on electrical characteristics of matching networks and on chamber geometry as on plasma sheath properties. We investigated such electrical effects in a 300-mm Applied-Materials plasma reactor. Data were taken for 13.56-MHz bias frequency (chuck) and for source frequencies from 30 to 160 MHz (upper electrode). An rf-magnetic-field probe (B-dot loop) was used to measure the radial variation of fields inside the plasma. We will describe the results of this work.

Plasma and sheath structure around a rf excited stepped electrode is investigated. Laser-induced fluorescence dip spectroscopy is used to spatially resolve sheath fields in an argon discharge while optical emission and laser-induced fluorescence are used to measure the spatial structure of the surrounding discharge for various discharge conditions and step-junction configurations. The presence of the step perturbs the spatial structure of the fields around the step as well as the excitation in the region above the step.

Two-dimensional maps of the sheath electric fields formed around a metal-dielectric interface were measured in a radio frequency (rf) argon plasma using laser-induced fluorescence-dip spectroscopy. Experimentally determined Stark shifts of the argon Rydberg 13d[3/2]1 state were used to quantify the electric fields in the sheath as functions of the rf cycle, voltage, and pressure. Both the structure of the sheath fields and the discharge characteristics in the region above the electrode depend on the discharge conditions and the configuration of the surface. Dissimilar materials placed adjacent to each other result in electric fields with a component parallel to the electrode surface.

Laser-induced fluorescence-dip spectroscopy was used to measure two-dimensional (2-D) maps of the electric field present in an argon discharge above a ratio frequency-powered, nonuniform surface. Electric fields were obtained from experimentally measured Stark shifts of the energy of argon Rydberg states. The 2-D maps of the electric fields demonstrated that nonuniformities present on an electrode have long-range effects on the structure of the sheath.