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Heavy ion radiation effects studies with ion photon emission microscopy

Hattar, Khalid M.; Powell, Cody J.; Doyle, Barney L.

The development of a new radiation effects microscopy (REM) technique is crucial as emerging semiconductor technologies demonstrate smaller feature sizes and thicker back end of line (BEOL) layers. To penetrate these materials and still deposit sufficient energy into the device to induce single event effects, high energy heavy ions are required. Ion photon emission microscopy (IPEM) is a technique that utilizes coincident photons, which are emitted from the location of each ion impact to map out regions of radiation sensitivity in integrated circuits and devices, circumventing the obstacle of focusing high-energy heavy ions. Several versions of the IPEM have been developed and implemented at Sandia National Laboratories (SNL). One such instrument has been utilized on the microbeam line of the 6 MV tandem accelerator at SNL. Another IPEM was designed for ex-vacu use at the 88 cyclotron at Lawrence Berkeley National Laboratory (LBNL). Extensive engineering is involved in the development of these IPEM systems, including resolving issues with electronics, event timing, optics, phosphor selection, and mechanics. The various versions of the IPEM and the obstacles, as well as benefits associated with each will be presented. In addition, the current stage of IPEM development as a user instrument will be discussed in the context of recent results.

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Imaging penetrating radiation through ion photon emission microscopy

Hattar, Khalid M.; Villone, J.; Powell, Cody J.; Doyle, Barney L.

The ion photon emission microscope (IPEM), a new radiation effects microscope for the imaging of single event effects from penetrating radiation, is being developed at Sandia National Laboratories and implemented on the 88' cyclotron at Lawrence Berkeley National Laboratories. The microscope is designed to permit the direct correlation between the locations of high-energy heavy-ion strikes and single event effects in microelectronic devices. The development of this microscope has required the production of a robust optical system that is compatible with the ion beam lines, design and assembly of a fast single photon sensitive measurement system to provide the necessary coincidence, and the development and testing of many scintillating films. A wide range of scintillating material for application to the ion photon emission microscope has been tested with few meeting the stringent radiation hardness, intensity, and photon lifetime requirements. The initial results of these luminescence studies and the current operation of the ion photon emission microscope will be presented. Finally, the planned development for future microscopes and ion luminescence testing chambers will be discussed.

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Radiation microscope for SEE testing using GeV ions

Villone, J.; Hattar, Khalid M.; Doyle, Barney L.; Knapp, J.A.

Radiation Effects Microscopy is an extremely useful technique in failure analysis of electronic parts used in radiation environment. It also provides much needed support for development of radiation hard components used in spacecraft and nuclear weapons. As the IC manufacturing technology progresses, more and more overlayers are used; therefore, the sensitive region of the part is getting farther and farther from the surface. The thickness of these overlayers is so large today that the traditional microbeams, which are used for REM are unable to reach the sensitive regions. As a result, higher ion beam energies have to be used (> GeV), which are available only at cyclotrons. Since it is extremely complicated to focus these GeV ion beams, a new method has to be developed to perform REM at cyclotrons. We developed a new technique, Ion Photon Emission Microscopy, where instead of focusing the ion beam we use secondary photons emitted from a fluorescence layer on top of the devices being tested to determine the position of the ion hit. By recording this position information in coincidence with an SEE signal we will be able to indentify radiation sensitive regions of modern electronic parts, which will increase the efficiency of radiation hard circuits.

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Phosphors' lifetime measurement employing the Time Between Photons method

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Rossi, P.; Doyle, Barney L.; Brice, D.K.; Vizkelethy, G.; McDaniel, F.D.; Branson, J.V.

The Time Between Photons theory (hereafter TBP) is applied to the evaluation of the lifetime of phosphors employed in the Ion Photon Emission Microscope (IPEM). IPEM allows Radiation Effects Microscopy (REM) without focused ion beams and appears to be the best tool for the radiation hardness assessment of modern integrated circuit at cyclotron energies. IPEM determines the impact point of a single ion onto the sample by measuring the light spot produced on a thin phosphor layer placed on the sample surface. The spot is imaged by an optical microscope and projected at high magnification onto a Position Sensitive Detector (PSD). Phosphors, when excited by an ion, emit photons with a particular lifetime, which is important to evaluate. We measured the statistical distribution of the Time Between consecutive detected Photons (TBP) for several phosphors and have been able to link it to their lifetime employing a theory that is derived in this paper. The single-photon signals are provided by the IPEM-PSD, or faster photomultipliers when high-speed materials had to be assessed. © 2009 Elsevier B.V. All rights reserved.

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Ion beam analysis of targets used in controlatron neutron generators

AIP Conference Proceedings

Banks, James C.; Walla, Lisa A.; Walsh, David S.; Doyle, Barney L.

Controlatron neutron generators are used for testing neutron detection systems at Sandia National Laboratories. To provide for increased tube lifetimes for the moderate neutron flux output of these generators, metal hydride (ZrT 2) target fabrication processes have been developed. To provide for manufacturing quality control of these targets, ion beam analysis techniques are used to determine film composition. The load ratios (i.e. T/Zr concentration ratios) of ZrT 2 Controlatron neutron generator targets have been successfully measured by simultaneously acquiring RBS and ERD data using a He ++ beam energy of 10 MeV. Several targets were measured and the film thicknesses obtained from RBS measurements agreed within ±2% with Dektak profilometer measurements. The target fabrication process and ion beam analysis techniques will be presented. © 2009 American Institute of Physics.

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A dual neutron/gamma source for the Fissmat Inspection for Nuclear Detection (FIND) system

Antolak, Arlyn J.; Doyle, Barney L.; King, Michael K.; Provencio, P.N.; Raber, Thomas N.

Shielded special nuclear material (SNM) is very difficult to detect and new technologies are needed to clear alarms and verify the presence of SNM. High-energy photons and neutrons can be used to actively interrogate for heavily shielded SNM, such as highly enriched uranium (HEU), since neutrons can penetrate gamma-ray shielding and gamma-rays can penetrate neutron shielding. Both source particles then induce unique detectable signals from fission. In this LDRD, we explored a new type of interrogation source that uses low-energy proton- or deuteron-induced nuclear reactions to generate high fluxes of mono-energetic gammas or neutrons. Accelerator-based experiments, computational studies, and prototype source tests were performed to obtain a better understanding of (1) the flux requirements, (2) fission-induced signals, background, and interferences, and (3) operational performance of the source. The results of this research led to the development and testing of an axial-type gamma tube source and the design/construction of a high power coaxial-type gamma generator based on the {sup 11}B(p,{gamma}){sup 12}C nuclear reaction.

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Results 101–125 of 176
Results 101–125 of 176