Publications

Swiler, Laura P.; van Bloemen Waanders, Bart G.; Jared, Bradley H.; Koepke, Joshua R.; Whetten, Shaun R.; Madison, Jonathan D.; Ivanoff, Thomas I.; Jackson, Olivia D.; Cook, Adam W.; Brown-Shaklee, Harlan J.; Kammler, Daniel K.; Johnson, Kyle J.; Ford, Kurtis R.; Bishop, Joseph E.; Roach, R.A.

This report summarizes the data analysis activities that were performed under the Born Qualified Grand Challenge Project from 2016 - 2018. It is meant to document the characterization of additively manufactured parts and processe s for this project as well as demonstrate and identify further analyses and data science that could be done relating material processes to microstructure to properties to performance.

Littlewood, David J.; van Bloemen Waanders, Bart G.; Hegde, Arun S.; Cook, Adam W.

Abstract not provided.

Journal of Materials Science

Plumley, John B.; Cook, Adam W.; Larsen, Christopher A.; Artyushkova, Kateryna; Han, Sang M.; Peng, Thomas L.; Kemp, Richard A.

Transparent electric conductors made of indium tin oxide (ITO)-doped glass prepared by a flash lamp annealing (FLA) process were compared with ITO-doped glass prepared via a conventional rapid thermal annealing (RTA) process. Stylus surface profilometry was used to determine thicknesses, scanning electron microscopy was used to image surfaces, X-ray diffraction was used to determine film structures, X-ray photoelectron spectroscopy was used to determine oxidation states and film compositions, 4-point probe measurements were used to determine electrical conductivities, UV–Vis spectroscopy was used to determine film transparencies, and selective light filtering was used to determine which wavelengths of light are needed to anneal ITO into a visibly transparent electrically conductive thin film via an FLA process. The results showed that FLA with visible light can be used to nearly instantaneously anneal ITO to create visibly transparent and electrically conductive ITO thin films on glass. The FLA process achieved this by predominately exciting unoxidized indium, unoxidized tin, tin monoxide (SnO), and non-stoichiometric indium oxide (InOx), appropriately distributed in an electron beam physical vapor-deposited amorphous ITO thin film, to allow their oxidation and crystallization into an electrically conductive visibly transparent ITO. Though it is possible to prepare ITO-doped glass that is more transparent with an RTA process, the FLA process is significantly faster, has comparable electrical conductivity, and can strongly localize heating to areas of the as-deposited ITO thin film that are not electrically conductive and visibly transparent.

Cook, Adam W.

Abstract not provided.

Celina, Mathias C.; Campbell, Christopher C.; Cook, Adam W.; Reinholtz, William; McElhanon, James R.

Abstract not provided.

Cook, Adam W.; Cook, Adam W.; Cook, Adam W.

Abstract not provided.

Roach, R.A.; Bishop, Joseph E.; Jared, Bradley H.; Keicher, David M.; Cook, Adam W.; Whetten, Shaun R.; Forrest, Eric C.; Stanford, Joshua S.; Boyce, Brad B.; Johnson, Kyle J.; Rodgers, Theron R.; Ford, Kurtis R.; Martinez, Mario J.; Moser, Daniel M.; van Bloemen Waanders, Bart G.; Chandross, M.; Abdeljawad, Fadi F.; Allen, Kyle M.; Stender, Michael S.; Beghini, Lauren L.; Swiler, Laura P.; Lester, Brian T.; Argibay, Nicolas A.; Brown-Shaklee, Harlan J.; Kustas, Andrew K.; Sugar, Joshua D.; Kammler, Daniel K.; Wilson, Mark A.

Abstract not provided.

Abdeljawad, Fadi F.; Bolintineanu, Dan S.; Cook, Adam W.; Brown-Shaklee, Harlan J.; Kammler, Daniel K.

Abstract not provided.

Perales, Diana P.; Bell, Nelson S.; Cook, Adam W.; Treadwell, LaRico J.; Hattar, Khalid M.; Reinholtz, William

Abstract not provided.

Price, Patrick M.; Cook, Adam W.; treadwell, larico t.; Hattar, Khalid M.

Abstract not provided.

Roach, R.A.; Jared, Bradley H.; Cook, Adam W.; Keicher, David M.; van Bloemen Waanders, Bart G.; Swiler, Laura P.; Seidl, Daniel T.; Wildey, Timothy M.; Whetten, Shaun R.

Abstract not provided.

DiAntonio, Christopher D.; Cook, Adam W.; Chavez, Tom C.; Evans, Lindsey E.; Reinholtz, William; Meyer, Kristin M.

Abstract not provided.

price, patrick p.; Briggs, Samuel B.; Cook, Adam W.; Treadwell, LaRico J.; Hattar, Khalid M.

Abstract not provided.

Abdeljawad, Fadi F.; Bolintineanu, Dan S.; Kammler, Daniel K.; Brown-Shaklee, Harlan J.; Cook, Adam W.

Abstract not provided.

Scripta Materialia

Jared, Bradley H.; Aguilo, Miguel A.; Beghini, Lauren L.; Boyce, Brad B.; Clark, Brett W.; Cook, Adam W.; Kaehr, Bryan J.; Robbins, Joshua R.

Additive manufacturing offers unprecedented opportunities to design complex structures optimized for performance envelopes inaccessible under conventional manufacturing constraints. Additive processes also promote realization of engineered materials with microstructures and properties that are impossible via traditional synthesis techniques. Enthused by these capabilities, optimization design tools have experienced a recent revival. The current capabilities of additive processes and optimization tools are summarized briefly, while an emerging opportunity is discussed to achieve a holistic design paradigm whereby computational tools are integrated with stochastic process and material awareness to enable the concurrent optimization of design topologies, material constructs and fabrication processes.

DiAntonio, Christopher D.; Cook, Adam W.; Chavez, Tom C.; Evans, Lindsey E.; Reinholtz, William; Meyer, Kristin M.

Abstract not provided.

Abdeljawad, Fadi F.; Bolintineanu, Dan S.; Cook, Adam W.; Brown-Shaklee, Harlan J.; Kammler, Daniel K.

Abstract not provided.

Abdeljawad, Fadi F.; Bolintineanu, Dan S.; Kammler, Daniel K.; Brown-Shaklee, Harlan J.; Cook, Adam W.

Abstract not provided.

Abdeljawad, Fadi F.; Bolintineanu, Dan S.; Cook, Adam W.; Brown-Shaklee, Harlan J.; Kammler, Daniel K.

Abstract not provided.

Keicher, David M.; Lavin, Judith M.; Appelhans, Leah A.; Whetten, Shaun R.; Mani, Seethambal S.; Moore, Penny B.; Cook, Adam W.; Acree, Nathan A.; Young, Nathan P.; Russell, Michael J.

Abstract not provided.

Choi, Junoh C.; Cook, Adam W.; DiAntonio, Christopher D.; Jared, Bradley H.; Winrow, Edward G.

Abstract not provided.

Abdeljawad, Fadi F.; Bolintineanu, Dan S.; Cook, Adam W.; Brown-Shaklee, Harlan J.; Kammler, Daniel K.

Abstract not provided.

Abdeljawad, Fadi F.; Bolintineanu, Dan S.; Brown-Shaklee, Harlan J.; Cook, Adam W.; Kammler, Daniel K.

Abstract not provided.

Abdeljawad, Fadi F.; Bolintineanu, Dan S.; Kammler, Daniel K.; Brown-Shaklee, Harlan J.; Cook, Adam W.

Abstract not provided.

Kaehr, Bryan J.; Cook, Adam W.

Abstract not provided.