Double sided grating fabrication for high energy X-ray phase contrast imaging
Materials Science in Semiconductor Processing
Hollowell, Andrew E.; Arrington, Christian L.; Finnegan, Patrick S.; Musick, Katherine M.; Resnick, Paul J.; Volk, Steve; Dagel, Amber L.
State of the art grating fabrication currently limits the maximum source energy that can be used in lab based x-ray phase contrast imaging (XPCI) systems. In order to move to higher source energies, and image high density materials or image through encapsulating barriers, new grating fabrication methods are needed. In this work we have analyzed a new modality for grating fabrication that involves precision alignment of etched gratings on both sides of a substrate, effectively doubling the thickness of the grating. We have achieved a front-to-backside feature alignment accuracy of 0.5 µm demonstrating a methodology that can be applied to any grating fabrication approach extending the attainable aspect ratios allowing higher energy lab based XPCI systems.