Publications

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Here, the design, fabrication, and characterization of an actively tunable long-wave infrared detector, made possible through direct integration of a graphene-enabled metasurface with a conventional type-II superlattice infrared detector, are reported. This structure allows for post-fabrication tuning of the detector spectral response through voltage-induced modification of the carrier density within graphene and, therefore, its plasmonic response. These changes modify the transmittance through the metasurface, which is fabricated monolithically atop the detector, allowing for spectral control of light reaching the detector. Importantly, this structure provides a fabrication-controlled alignment of the metasurface filter to the detector pixel and is entirely solid-state. Using single pixel devices, relative changes in the spectral response exceeding 8% have been realized. These proof-of-concept devices present a path toward solid-state hyperspectral imaging with independent pixel-to-pixel spectral control through a voltage-actuated dynamic response.

Anisotropic carrier transport properties of unintentionally doped InAs/InAs0.65Sb0.35 type-II strain-balanced superlattice material are evaluated using temperature-and field-dependent magnetotransport measurements performed in the vertical direction on a substrate-removed metal-semiconductor-metal device structure. To best isolate the measured transport to the superlattice, device fabrication entails flip-chip bonding and backside device processing to remove the substrate material and deposit contact metal directly to the bottom of an etched mesa. High-resolution mobility spectrum analysis is used to calculate the conductance contribution and corrected mixed vertical-lateral mobility of the two carrier species present. Combining the latter with lateral mobility results from in-plane magnetotransport measurements on identical superlattice material allows for the calculation of the true vertical majority electron and minority hole mobilities; amplitudes of 4.7 × 10 3 cm2/V s and 1.60 cm2/V s are determined at 77 K, respectively. The temperature-dependent results show that vertical hole mobility rapidly decreases with decreasing temperature due to trap-induced localization and then hopping transport, whereas vertical electron mobility appears phonon scattering-limited at high temperature, giving way to interface roughness scattering at low temperatures, analogous to the lateral electron mobility but with a lower overall magnitude.

As the potential applications of GaN and Ga₂O₃ are limited by the inadequacy of conventional doping techniques, specifically when uniform selective area p-type doping is required, the potential for transmutation doping of these materials is analyzed. All transmuted element concentrations are reported as a function of time for several common proton and neutron radiation sources, showing that previously published results considered a small subset of the dopants produced. A 40 MeV proton accelerator is identified as the most effective transmutation doping source considered, with a 2.25 × 10¹⁷ protons per cm² fluence yielding net concentrations of uncompensated p-type dopants of 7.7 × 10¹⁵ and 8.1 × 1015 cm^-3 for GaN and Ga₂O₃, respectively. Furthermore, it is shown that high energy proton accelerator spectra are capable of producing dopants required for magnetic and neutron detection applications, although not of the concentrations required for current applications using available irradiation methods.

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Accurate p-type doping of the active region in III-V infrared detectors is essential for optimizing the detector design and overall performance. While most III-V detector absorbers are n-type (e.g., nBn), the minority carrier devices with p-type absorbers would be expected to have relatively higher quantum efficiencies due to the higher mobility of minority carrier electrons. However, there are added challenges to determining the hole carrier concentration in narrow bandgap InAsSb due to the potential for electron accumulation at the surface of the material and at its interface with the layer grown directly below it. Electron accumulation layers form high conductance electron channels that can dominate both resistivity and Hall-effect transport measurements. Therefore, to correctly determine the bulk hole concentration and mobility, temperature- and magnetic-field-dependent transport measurements in conjunction with Multi-Carrier Fit analysis were utilized on a series of p-doped InAs0.91Sb0.09 samples on GaSb substrates. The resulting hole concentrations and mobilities at 77 K (300 K) are 1.6 × 1018 cm−3 (2.3 × 1018 cm−3) and 125 cm2 V−1 s−1 (60 cm2 V−1 s−1), respectively, compared with the intended Be-doping of ∼2 × 1018 cm−3. A surface treatment experiment is conducted to associate one of the electron conducting populations to the surface. Variable temperature (15–390 K) measurements confirmed the different carrier species present in the sample and enabled the extraction of the bulk heavy hole, interface carriers and surface electron transport properties. For the bulk carrier, a thermal activation of intrinsic carriers is identified at high temperatures with a bandgap of EG ∼ 258 meV and the low temperature data suggests an activation energy of EA ∼ 22 meV for the Be dopant atoms. Finally, temperature analysis confirms a surface carrier electron with resulting mobilities and sheet concentrations at 30 K (300 K) of 4500 cm2 V−1 s−1 (4300 ± 100 cm2 V−1 s−1) and 5.6 × 1010 cm−2 (6 × 1010 ± 2 × 1010 cm−2), respectively.

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