Publications

Macromolecules

Leguizamon, Samuel C.; Foster, Jeffrey C.; Appelhans, Leah A.; Monk, Nicolas M.; Zapien, Elizabeth M.; Yoon, Alana Y.; Hochrein, Madison T.

Recent progress in photoinitiated ring-opening metathesis polymerization (photoROMP) has enabled the lithographic production of patterned films from olefinic resins. Recently, we reported the use of a latent ruthenium catalyst (HeatMet) in combination with a photosensitizer (2-isopropylthioxanthone) to rapidly photopolymerize dicyclopentadiene (DCPD) formulations upon irradiation with UV light. While this prior work was limited in terms of catalyst and photosensitizer scope, a variety of alternative catalysts and photosensitizers are commercially available that could allow for tuning of thermomechanical properties, potlifes, activation rates, and irradiation wavelengths. Herein, 14 catalysts and 8 photosensitizers are surveyed for the photoROMP of DCPD and the structure–activity relationships of the catalysts examined. Properties relevant to stereolithography additive manufacturing (SLA AM)-potlife, irradiation dose required to gel, conversion-are characterized to develop catalyst and photosensitizer libraries to inform development of SLA AM resin systems. Two optimized catalyst/photosensitizer systems are demonstrated in the rapid SLA printing of complex, multidimensional pDCPD structures with microscale features under ambient conditions.

Advanced Science

Foster, Jeffrey C.; Cook, Adam W.; Monk, Nicolas M.; Jones, Brad H.; Appelhans, Leah A.; Redline, Erica M.; Leguizamon, Samuel C.

The development of chemistry is reported to implement selective dual-wavelength olefin metathesis polymerization for continuous additive manufacturing (AM). A resin formulation based on dicyclopentadiene is produced using a latent olefin metathesis catalyst, various photosensitizers (PSs) and photobase generators (PBGs) to achieve efficient initiation at one wavelength (e.g., blue light) and fast catalyst decomposition and polymerization deactivation at a second (e.g., UV-light). This process enables 2D stereolithographic (SLA) printing, either using photomasks or patterned, collimated light. Importantly, the same process is readily adapted for 3D continuous AM, with printing rates of 36 mm h–1 for patterned light and up to 180 mm h–1 using un-patterned, high intensity light.