InAs-based interband cascade lasers (ICLs) can be more easily adapted toward long wavelength operation than their GaSb counterparts. Devices made from two recent ICL wafers with an advanced waveguide structure are reported, which demonstrate improved device performance in terms of reduced threshold current densities for ICLs near 11 μm or extended operating wavelength beyond 13 μm. The ICLs near 11 μm yielded a significantly reduced continuous wave (cw) lasing threshold of 23 A/cm2 at 80 K with substantially increased cw output power, compared with previously reported ICLs at similar wavelengths. ICLs made from the second wafer incorporated an innovative quantum well active region, comprised of InAsP layers, and lased in the pulsed-mode up to 120 K at 13.2 μm, which is the longest wavelength achieved for III-V interband lasers.
Enhancing the efficiency of second-harmonic generation using all-dielectric metasurfaces to date has mostly focused on electromagnetic engineering of optical modes in the meta-atom. Further advances in nonlinear conversion efficiencies can be gained by engineering the material nonlinearities at the nanoscale, however this cannot be achieved using conventional materials. Semiconductor heterostructures that support resonant nonlinearities using quantum engineered intersubband transitions can provide this new degree of freedom. By simultaneously optimizing the heterostructures and meta-atoms, we experimentally realize an all-dielectric polaritonic metasurface with a maximum second-harmonic generation power conversion factor of 0.5 mW/W2 and power conversion efficiencies of 0.015% at nominal pump intensities of 11 kW/cm2. These conversion efficiencies are higher than the record values reported to date in all-dielectric nonlinear metasurfaces but with 3 orders of magnitude lower pump power. Our results therefore open a new direction for designing efficient nonlinear all-dielectric metasurfaces for new classical and quantum light sources.
We demonstrate an extremely nonlinear all-dielectric metasurface that employs intersubband polaritons to achieve a second-harmonic conversion coefficient of 5 x 10-4 W-1 and second-harmonic power conversion efficiency of 0.015% at nominal pump intensities of 11 kW/cm2. Furthermore, through heterostructure design, we achieve microscopic control of the nonlinearity and demonstrate suppression or enhancement of second-harmonic generation by controlling the polarity of the resonant χ(2).
Carrasco, Rigo A.; Morath, Christian P.; Grant, Perry C.; Ariyawansa, Gamini; Stephenson, Chad A.; Kadlec, Clark N.; Hawkins, Samuel D.; Klem, John F.; Shaner, Eric A.; Steenbergen, Elizabeth H.; Schaefer, Stephen T.; Johnson, Shane R.; Webster, Preston T.
Gallium is incorporated into the strain-balanced In(Ga)As/InAsSb superlattice system to achieve the same mid-wave infrared cutoff tunability as conventional Ga-free InAs/InAsSb type-II superlattices, but with an additional degree of design freedom to enable optimization of absorption and transport properties. Time-resolved photoluminescence measurements of InGaAs/InAsSb superlattice characterization- and doped device structures are reported from 77 to 300 K and compared to InAs/InAsSb. The low-injection photoluminescence decay yields the minority carrier lifetime, which is analyzed with a recombination rate model, enabling the determination of the temperature-dependent Shockley-Read-Hall, radiative, and Auger recombination lifetimes and extraction of defect energy levels and capture cross section defect concentration products. The Shockley-Read-Hall-limited lifetime of undoped InGaAs/InAsSb is marginally reduced from 2.3 to 1.4 μs due to the inclusion of Ga; however, given that Ga improves the vertical hole mobility by a factor of >10×, a diffusion-limited InGaAs/InAsSb superlattice nBn could expect a lower bound of 2.5× improvement in diffusion length with significant impact on photodetector quantum efficiency and radiation hardness. At temperatures below 120 K, the doped device structures are Shockley-Read-Hall limited at 0.5 μs, which shows promise for detector applications.
Mie-resonant dielectric metasurfaces are excellent candidates for both fundamental studies related to light-matter interactions and for numerous applications ranging from holography to sensing to nonlinear optics. To date, however, most applications using Mie metasurfaces utilize only weak light-matter interaction. Here, we go beyond the weak coupling regime and demonstrate for the first time strong polaritonic coupling between Mie photonic modes and intersubband (ISB) transitions in semiconductor heterostructures. Furthermore, along with demonstrating ISB polaritons with Rabi splitting as large as 10%, we also demonstrate the ability to tailor the strength of strong coupling by engineering either the semiconductor heterostructure or the photonic mode of the resonators. Unlike previous plasmonic-based works, our new all-dielectric metasurface approach to generate ISB polaritons is free from ohmic losses and has high optical damage thresholds, thereby making it ideal for creating novel and compact mid-infrared light sources based on nonlinear optics.
We have fabricated and characterized AlInAsSb- and InPAsSb-absorber nBn infrared detectors with 200 K cutoff wavelengths from 2.55 to 3.25 μm. Minority-carrier lifetimes determined by microwave reflectance measurements were 0.2-1.0 μs in doped n-type absorber materials. Devices having 4 μm thick absorbers exhibited sharp cutoff at wavelengths of 2.9 μm or longer and softer cutoff at shorter wavelengths. Top-illuminated devices with n+ InAs window/contact layers had external quantum efficiencies of 40-50% without anti-reflection coating at 50 mV reverse bias and wavelengths slightly shorter than cutoff. Despite the shallow-etch mesa nBn design, perimeter currents contributed significantly to the 200 K dark current. Dark currents for InPAsSb devices were lower than AlInAsSb devices with similar cutoff wavelengths. For unoptimized InPAsSb devices with 2.55 μm cutoff, 200 K areal and perimeter dark current densities at -0.2 V bias in devices of various sizes were approximately 1x10-7 A/cm2 and 1.4x10-8 A/cm, respectively.
Here, the design, fabrication, and characterization of an actively tunable long-wave infrared detector, made possible through direct integration of a graphene-enabled metasurface with a conventional type-II superlattice infrared detector, are reported. This structure allows for post-fabrication tuning of the detector spectral response through voltage-induced modification of the carrier density within graphene and, therefore, its plasmonic response. These changes modify the transmittance through the metasurface, which is fabricated monolithically atop the detector, allowing for spectral control of light reaching the detector. Importantly, this structure provides a fabrication-controlled alignment of the metasurface filter to the detector pixel and is entirely solid-state. Using single pixel devices, relative changes in the spectral response exceeding 8% have been realized. These proof-of-concept devices present a path toward solid-state hyperspectral imaging with independent pixel-to-pixel spectral control through a voltage-actuated dynamic response.
The Lorentz-like effective medium resonance (LEMR) exhibited by the longitudinal effective permittivity of semiconductor hyperbolic metamaterials (SHMs) has been known for some time. However, direct observation of this resonance proved to be difficult. Herein, we experimentally demonstrate its existence by strongly coupling SHMs to plasmonic metasurfaces. We consider four strong coupling implementations of SHMs that exhibit different LEMR absorption profiles (both in frequency and in strength) to validate our approach.
Fink, D.R.; Lee, S.; Kodati, S.H.; Rogers, V.; Ronningen, T.J.; Winslow, M.; Grein, C.H.; Jones, A.H.; Campbell, J.C.; Klem, John F.; Krishna, S.
We present a method of determining the background doping type in semiconductors using capacitance-voltage measurements on overetched double mesa p-i-n or n-i-p structures. Unlike Hall measurements, this method is not limited by the conductivity of the substrate. By measuring the capacitance of devices with varying top and bottom mesa sizes, we were able to conclusively determine which mesa contained the p-n junction, revealing the polarity of the intrinsic layer. This method, when demonstrated on GaSb p-i-n and n-i-p structures, concluded that the material is residually doped p-type, which is well established by other sources. The method was then applied to a 10 monolayer InAs/10 monolayer AlSb superlattice, for which the doping polarity was unknown, and indicated that this material is also p-type.
Proceedings of SPIE - The International Society for Optical Engineering
Fink, D.R.; Lee, S.; Kodati, S.H.; Dahiya, V.; Ronningen, T.J.; Winslow, M.; Grein, C.H.; Jones, A.H.; Campbell, J.C.; Klem, John F.; Krishna, S.
We present a method of determining the background doping type in semiconductors using capacitance-voltage measurements on overetched double mesa p-i-n or n-i-p structures. Unlike Hall measurements, this method is not limited by the conductivity of the substrate. By measuring the capacitance of devices with varying top and bottom mesa sizes, we were able to conclusively determine which mesa contained the p-n junction, revealing the polarity of the intrinsic layer. This method, when demonstrated on GaSb p-i-n and n-i-p structures, determined that the material is residually doped p-type, which is well established by other sources. The method was then applied on a 10 monolayer InAs/10 monolayer AlSb superlattice, for which the doping polarity was unknown, and indicated that this material is also p-type.
An InGaAs/GaAsSb Type-II superlattice is explored as an absorber material for extended short-wave infrared detection. A 10.5 nm period was grown with an InGaAs/GaAsSb thickness ratio of 2 with a target In composition of 46% and target Sb composition of 62%. Cutoff wavelengths near 2.8 μm were achieved with responsivity beyond 3 μm. Demonstrated dark current densities were as low as 1.4 mA/cm2 at 295K and 13 μA/cm2 at 235K at -1V bias. A significant barrier to hole extraction was identified in the detector design that severely limited the external quantum efficiency (EQE) of the detectors. A redesign of the detector that removes that barrier could make InGaAs/GaAsSb very competitive with current commercial HgCdTe and extended InGaAs technology.
Characterization of vertical transport in semiconductor heterostructures is extremely difficult and often impractical. Measurements that are relatively straight forward in lateral transport using Hall methods, such as quantifying carrier density or mobility, have no analog in conventional vertical devices. Doppler charge velocimetry may provide an alternative approach to obtaining transport information. We hypothesize that we can drive vertical currents in structures like heterojunction bipolar transistors or nBn detectors, illuminate them with microwaves, and directly measure the carrier velocities through Doppler shifts imparted on the reflected microwave signal. Some challenges involve providing optical injection and working in the vertical geometry required to extract the desired information. While progress was made to this end, experiments have not yet proved successful. Implications for infrared material characterization are summarized at the end of this document.