This paper introduces approaches that combine micro/nanomolding, or nanoimprinting, techniques with proximity optical phase mask lithographic methods to form three dimensional (3D) nanostructures in thick, transparent layers of photopolymers. The results demonstrate three strategies of this type, where molded relief structures in these photopolymers represent (i) fine (<1 μm) features that serve as the phase masks for their own exposure, (ii) coarse features (>1 μm) that are used with phase masks to provide access to large structure dimensions, and (iii) fine structures that are used together phase masks to achieve large, multilevel phase modulations. Several examples are provided, together with optical modeling of the fabrication process and the transmission properties of certain of the fabricated structures. Lastly, these approaches provide capabilities in 3D fabrication that complement those of other techniques, with potential applications in photonics, microfluidics, drug delivery and other areas.
The purpose of this project was to do some preliminary studies and process development on electroactive polymers to be used for tunable optical elements and MEMS actuators. Working in collaboration between Sandia National Labs and The University of Illinois Urbana-Champaign, we have successfully developed a process for applying thin films of poly (vinylidene fluoride) (PVDF) onto glass substrates and patterning these using a novel stamping technique. We observed actuation in these structures in static and dynamic measurements. Further work is needed to characterize the impact that this approach could have on the field of tunable optical devices for sensing and communication.