Solid State Capture Gated Spectrometer for the Detection of Fission Neutrons
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With the exception of large laboratory devices with very low sensitivities, a neutron spectrometer have not been built for fission neutrons such as those emitted by special nuclear materials (SNM). The goal of this work was to use a technique known as Capture Gated Neutron Spectrometry to develop a solid-state device with this functionality. This required modifications to trans-stilbene, a known solid-state scintillator. To provide a neutron capture signal we added lithium to this material. This unique triggering signal allowed identification of neutrons that lose all of their energy in the detector, eliminating uncertainties that arise due to partial energy depositions. We successfully implemented a capture gated neutron spectrometer and were able to distinguish an SNM like fission spectrum from a spectrum stemming from a benign neutron source.
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Resist substrates used in the LIGA process must provide high initial bond strength between the substrate and resist, little degradation of the bond strength during x-ray exposure, acceptable undercut rates during development, and a surface enabling good electrodeposition of metals. Additionally, they should produce little fluorescence radiation and give small secondary doses in bright regions of the resist at the substrate interface. To develop a new substrate satisfying all these requirements, we have investigated secondary resist doses due to electrons and fluorescence, resist adhesion before exposure, loss of fine features during extended development, and the nucleation and adhesion of electrodeposits for various substrate materials. The result of these studies is a new anodized aluminum substrate and accompanying methods for resist bonding and electrodeposition. We demonstrate successful use of this substrate through all process steps and establish its capabilities via the fabrication of isolated resist features down to 6 {micro}m, feature aspect ratios up to 280 and electroformed nickel structures at heights of 190 to 1400 {micro}m. The minimum mask absorber thickness required for this new substrate ranges from 7 to 15 {micro}m depending on the resist thickness.
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The LIGA process has the ability to fabricate very precise, high aspect ratio mesoscale structures with microscale features [l]. The process consists of multiple steps before a final part is produced. Materials native to the LIGA process include metals and photoresists. These structures are routinely measured for quality control and process improvement. However, metrology of LIGA structures is challenging because of their high aspect ratio and edge topography. For the scale of LIGA structures, a programmable optical microscope is well suited for lateral (XU) critical dimension measurements. Using grayscale gradient image processing with sub-pixel interpolation, edges are detected and measurements are performed. As with any measurement, understanding measurement uncertainty is necessary so that appropriate conclusions are drawn from the data. Therefore, the abilities of the inspection tool and the obstacles presented by the structures under inspection should be well understood so that precision may be quantified. This report presents an inspection method for LIGA microstructures including a comprehensive assessment of the uncertainty for each inspection scenario.