Reduced temperature preparation of atomically clean Si surfaces to augment CMOS with atomic precision devices
Pena, Luis F.; Anderson, Evan M.; Mudrick, John M.; Campbell, DeAnna M.; Katzenmeyer, Aaron M.; Lu, Tzu-Ming L.; Leenheer, Andrew J.; Ivie, Jeffrey A.; Schmucker, Scott W.; Scrymgeour, David S.; Misra, Shashank M.
Abstract not provided.