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Reduced temperature preparation of atomically clean Si surfaces to augment CMOS with atomic precision devices

Anderson, Evan M.; Pena, Luis F.; Mudrick, John M.; Campbell, DeAnna M.; Katzenmeyer, Aaron M.; Tracy, Lisa A.; Lu, Tzu-Ming L.; Leenheer, Andrew J.; Ivie, Jeffrey A.; Schmucker, Scott W.; Scrymgeour, David S.; Misra, Shashank M.

Abstract not provided.