Publications

Quantum Nanofabrication: Mechanisms and Fundamental Limits

Wang, George T.; Coltrin, Michael E.; Lu, Ping L.; Miller, Philip R.; Leung, Benjamin L.; Xiao, Xiaoyin X.; Sapkota, Keshab R.; Leonard, Francois L.; Bran Anleu, Gabriela A.; Koleske, Daniel D.; Tsao, Jeffrey Y.; Balakrishnan, Ganesh B.; Addamane, Sadhvikas A.; Nelson, Jeffrey S.

Quantum-size-controlled photoelectrochemical (QSC-PEC) etching, which uses quantum confinement effects to control size, can potentially enable the fabrication of epitaxial quantum nanostructures with unprecedented accuracy and precision across a wide range of materials systems. However, many open questions remain about this new technique, including its limitations and broader applicability. In this project, using an integrated experimental and theoretical modeling approach, we pursue a greater understanding of the time-dependent QSC-PEC etch process and to uncover the underlying mechanisms that determine its ultimate accuracy and precision. We also seek to broaden our understanding of the scope of its ultimate applicability in emerging nanostructures and nanodevices.