Publications

Particle-in-Cell Modeling of Low Pressure Capacitively Coupled Plasmas for High Aspect Ratio Etching

Lietz, Amanda M.; Rauf, Shahid R.; Kenney, Jason K.; Tian, Peng T.; Hopkins, Matthew M.

Plasma etching of semiconductors is an essential process in the production of microchips which enable nearly every aspect of modern life. Two frequencies of applied voltage are often used to provide control of both the ion fluxes and energy distribution.