Publications

Nature of the parasitic chemistry during AlGaInN OMVPE

Creighton, J.R.; Creighton, J.R.; Wang, George T.; Breiland, William G.; Coltrin, Michael E.

Using in situ laser light scattering, we have observed gas-phase nanoparticles formed during AlN, GaN and InN OMVPE. The response of the scattering intensity to a wide range of conditions indicates that the AlN parasitic chemistry is considerably different from the corresponding GaN and InN chemistry. A simple CVD particle-growth mechanism is introduced that can qualitatively explain the observed particle size and yields a strong residence time dependence. We also used FTIR to directly examine the reactivity of the metalorganic precursors with NH{sub 3} in the 25-300 C range. For trimethylaluminum/NH{sub 3} mixtures a facile CH{sub 4} elimination reaction is observed, which also produces gas-phase aminodimethylalane, i.e. Al(CH{sub 3}){sub 2}NH{sub 2}. For trimethylgallium and trimethylindium the dominant reaction is reversible adduct formation. All of the results indicate that the AlN particle-nucleation mechanism is predominately of a concerted nature, while the GaN and InN particle-nucleation mechanisms involve homogeneous pyrolysis and radical chemistry.