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Materials Study of NbN and TaxN Thin Films for SNS Josephson Junctions

Missert, Nancy A.; Brunke, Lyle B.; Henry, Michael D.; Wolfley, Steven L.; Howell, Stephen W.; Mudrick, John M.; Lewis, Rupert

Properties of NbN and TaxN thin films grown at ambient temperatures on SiO2/Si substrates by reactive-pulsed laser deposition and reactive magnetron sputtering (MS) as a function of N2 gas flow were investigated. Both techniques produced films with smooth surfaces, where the surface roughness did not depend on the N2 gas flow during growth. High crystalline quality, (111) oriented NbN films with Tc up to 11 K were produced by both techniques for N contents near 50%. The low temperature transport properties of the TaxN films depended upon both the N2 partial pressure used during growth and the film thickness. The root mean square surface roughness of TaxN films grown by MS increased as the film thickness decreased down to 10 nm.