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Low-Temperature Processing for Atomically Precise Dopant Incorporation with CMOS Integration

Schmucker, Scott W.; Anderson, Evan M.; Frederick, Esther F.; Ivie, Jeffrey A.; Bussmann, Ezra B.; Campbell, DeAnna M.; Tracy, Lisa A.; Lu, Tzu-Ming L.; Lu, Ping L.; Wang, George T.; Ward, Daniel R.; Misra, Shashank M.

Abstract not provided.