Publications

Growth Temperature Dependence of Si Doping Efficiency and Compensating Deep Level Defect Incorporation in Al_0.7Ga_0.3N

Armstrong, Andrew A.; Moseley, Michael; Allerman, A.A.; Crawford, Mary H.; Wierer, Jonathan W.

The growth temperature dependence of Si doping efficiency and deep level defect formation was investigated for n-type Al_0.7Ga_0.3N. It was observed that dopant compensation was greatly reduced with reduced growth temperature. Furthermore, deep level optical spectroscopy and lighted capacitance-voltage were used to understand the role of acceptor-like deep level defects on doping efficiency. Deep level defects were observed at 2.34 eV, 3.56 eV, and 4.74 eV below the conduction band minimum. The latter two deep levels were identified as the major compensators because the reduction in their concentrations at reduced growth temperature correlated closely with the concomitant increase in free electron concentration. Possible mechanisms for the strong growth temperature dependence of deep level formation are considered, which includes thermodynamically driven compensating defect formation that can arise for a semiconductor with very large band gap energy, such as Al_0.7Ga_0.3N.