Publications

Determination of wafer and process induced resonant frequency variation in silicon microdisk-resonators

Zortman, William A.; Watts, Michael W.; Trotter, Douglas C.

By comparing the frequency deviations of the TE and TM modes of identically designed silicon microdisk-resonators across a wafer, we demonstrate that layer thickness non-uniformity is the dominant cause of fabrication-induced microdisk-resonator frequency deviation. © 2009 Optical Society of America.