Publications

D loss as a function of temperature in ERD2 films on kovar with and without an intermediate Mo diffusion barrier

Kammler, Daniel K.; Wampler, William R.; Van Deusen, Stuart B.; King, Saskia H.; Tissot, Ralph G.; Brewer, Luke N.; Espada Castillo, Loren I.; Goeke, Ronald S.

The mechanisms governing D loss in ErD2 films with and without a Mo diffusion barrier on kovar substrates were studied between 200 and 600 °C via in-situ Ion Beam Analysis (IBA). Significant intermixing between kovar and Er was observed above 450°C and between kovar and ErD2 above 500 °C. The D loss mechanism in ErD2 films was found to change from intermixing between kovar and ErD2 at low temperatures (< 500 °C) to thermal decomposition at higher temperatures (> 500 °C). Diffusion between kovar and ErD2 was measured isothermally at 500 and 550 °C. An activation energy of 2.1 eV and a pre-exponential factor of 0.071 cm2/s were determined. Diffusion between the kovar components and ErD2 film was inhibited by depositing a 200 nm Mo diffusion barrier between the kovar substrate and the ErD2 film. The processing of the Mo diffusion barrier was shown to impact its performance. Intermixing between the kovar / Mo / ErD2 stack becomes significant between 500 and 550 °C with a sputter deposited Mo diffusion barrier and between 550 and 600 °C for an electron-beam evaporated Mo diffusion barrier. Copyright © 2009 ASM International® All rights reserved.