Publications
Chemical reactions in TEOS/ozone chemical vapor deposition[TetraEthylOrtho Silicate]
A reaction mechanism for TEOS/O{sub 3} CVD in a SVG/WJ atmospheric pressure furnace belt reactor has been developed and calibrated with experimental deposition rate data. One-dimensional simulations using this mechanism successfully reproduce the trends observed in a set of 31 experimental runs in a WJ-TEOS999 reactor. Two-dimensional simulations using this mechanism successfully reproduce the average deposition rates for 3 different experimental conditions in a WJ-1500TF reactor, although the deposition profiles predicted by the model are flatter than the experimental static prints.